靶电流对TiAlN / TiN复合膜组织及硬度的影响
Effects of Target Current on Structure and Hardness of TiAlN / TiN Composite Film
卢 龙1,2, 任明皓3, 蒋 涛3, 严 铿3
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作者单位:(1. 淮海工学院 机械工程学院, 江苏 连云港 222005; 2. 重庆大学 机械传动国家重点实验室, 重庆 400044; 3.江苏科技大学 材料学院, 江苏 镇江 212003)
中文关键字:多弧离子镀; TiAlN; TiN; 靶电流
英文关键字:multi-arc ion; TiAlN; TiN; target current
中文摘要:采用多弧离子镀技术在40Cr基体上制备TiAlN/TiN复合膜层,通过金相显微镜、扫描电镜和显微硬度仪研究靶电流对膜层表面形貌、沉积率及硬度的影响。结果表明: 靶材电流对膜层组织和硬度有显著影响,电流越高膜层表面越不平整,显微硬度随靶材电流的升高先上升后降低。靶电流越高,膜层中Ti、Al原子的含量就越高。
英文摘要:TiAlN/TiN composite film was prepared on 40Cr steel substrate using multi-arc ion technology. The effects of target current on structure, deposition rate and microhardness of TiAlN/TiN film were studied with metallographic microscope, SEM and microhardness instrument. The results show that the target current has a great influence on the performance of TiAlN/TiN film. The surface of film becomes out-of-flatness by increasing target current. The microhardness and the content of Ti/Al in film increase with the increase of target current.