脉冲单电源等离子表面渗铬层组织分析
Microstructure Analysis on Plasma Chromizing Layer Formed by Single Pulse Power Supply
陈选楠, 高 原, 李 冰, 黄学锋
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作者单位:(桂林电子科技大学 材料科学与工程学院, 广西 桂林 541004)
中文关键字:脉冲电源; 等离子渗铬; 扩散层; 沉积层
英文关键字:pulse power supply; plasma chromizing; diffusion layer; deposition layer
中文摘要:利用脉冲单电源在碳钢表面进行等离子渗铬,对850 ℃和1100 ℃条件下得到的渗层组织进行了分析。结果表明:850 ℃所得渗层和基体之间有两条明显的分界线,说明在渗铬过程中,发生了两次反应扩散相变;在1100 ℃条件下,渗层和基体之间有一条明显的分界线,说明在渗铬过程中,发生了一次反应扩散相变;两种工艺得到的渗层厚度分别为170 μm和140 μm, 表面的含铬量分别为9.25%和40%(质量分数), 渗铬层主要相组成为Fe-Cr固溶体;在1100 ℃条件下,渗层是由沉积层+扩散层组成,沉积层的形成阻碍了扩散层的进一步加厚。
英文摘要:The plasma chromizing process was realized by single pulse power supply on carbon steel surface. The microstructure of alloying layer at 850 ℃ and 1100 ℃ was investigated. The results show that, treated at 850 ℃, two dividing lines forms between the diffusion layer and the substrate, which means that two reaction-diffusion phase transformations happens; at 1100 ℃, one dividing line lies between the diffusion layer and the substrate, which suggests that in this condition one reaction-diffusion phase transformation happens. The depth of alloying layer is 170 μm and 140 μm, respectively. The surface chromium contents are 9.25% and 40%(wt%). The main phase of the alloying layer is Fe-Cr solid solution. At 1100 ℃, the alloying layer is composed of deposition layer and diffusion layer. The formation of deposition layer blocks the growth of diffusion layer.