Abstract: Titanium nitride thin films have excellent coating properties, such as high hardness, low resistivity and good corrosion resistance and wear resistance, which are widely used in automotive, aerospace and biomedical applications.Magnetron sputtering technology has become one of the main technologies for the preparation of titanium nitride films because of its low cost, high deposition rate and green environmental protection.The effects of magnetron sputtering process parameters on selective orientation, grain size, film thickness, phase composition and mechanical properties of titanium nitride films were reviewed.In addition, the influence of the type, concentration and different annealing temperature of doped elements on the microstructure and properties of titanium nitride films was also discussed.Finally, the research difficulties of preparing titanium nitride thin films by magnetron sputtering were put forward, and the development direction of preparing titanium nitride thin films by magnetron sputtering technology in the future was prospected.