Abstract: Aiming at the problems of low target utilization and uneven etching in magnetron sputtering deposition coating technology, based on computer numerical simulation technology, by the design of structural parameters of inner and outer magnets of rectangular planar magnetron sputtering target and the setting of length and thickness of magnetic guide plate, this paper simulates and analyzes the inner and outer magnets and magnetic guide plate under different structural parameters, The surface magnetic field and magnetic induction intensity distribution of the target.The results show that the maximum magnetic induction intensity of the horizontal magnetic field on the target surface is about 35 mt and the horizontal magnetic induction distribution is uniform under the structural parameters of 12 mm high and 20 mm diameter of the inner magnet, 16 mm high and 10 mm diameter of the outer magnet.At the same time, after setting a magnetic guide plate with a length of 5 mm and a thickness of 2 mm, it can more significantly improve the horizontal magnetic field distribution on the target surface, improve the utilization rate of the target, and then improve the comprehensive performance of the deposited coating as a whole.The target structure parameters with moderate horizontal magnetic induction intensity and reasonable distribution on the target surface can be obtained by simulation analysis, which has guiding significance for the design of practical magnetron sputtering target.